The Silicon Nitride Support Films are made by state-of-the-art semiconductor and patented MEMS fabrication techniques using resilient, low-stress inorganic and amorphous silicon nitride thin films supported by a sturdy silicon frame. Silicon Nitride Support Films are available in six window sizes combined with either 8, 15, 35, 50, 100, or 200nm thin membrane thickness on an EM industry standard 3mm diameter round frame, making them the most desirable and useful silicon nitride support films in the current marketplace.

Silicon Nitride Support Films have the advantages of being chemically and mechanically robust and can withstand temperature changes up to 1000°C. They are extremely stable and suitable to conduct a variety of nanotechnology experiments with particles or cells mounted directly on the support films.